Model-based proximity effect correction for electron-beam direct-write lithography

Journal

Advanced Lithography 2010 -- Proc. SPIE 7637, Alternative Lithographic Technologies II

Pages

76371V

Date Issued

2010-02

Author(s)

Chun-Hung Liu

Pei-Lin Tien

Philip C. W. Ng

Yu-Tian Shen

Kuen-Yu Tsai

DOI

URI

Type

conference paper