Capacitor and coupled inductor with high process tolerance in LTCC
Date Issued
2006-10
Author(s)
Abstract
A new structure of capacitor and coupled multilayer inductor that can tolerate the misalignment between layers in LTCC process up to 50 mum are proposed. Simulation results show that proposed coupled inductor has much better resistance to process misalignment than traditional straight line coupled inductors
SDGs
Type
conference paper