Fabrication of Optical Waveguide Devices Using Gas-Assisted UV Nanoimprinting with Soft Mold
Date Issued
2005
Date
2005
Author(s)
Weng, Yung-Chun
DOI
zh-TW
Abstract
Abstract
This thesis is devoted to the fabrication of optical waveguide using gas-assisted imprinting with soft mold. The process integrates lithography、UV curable photoresist and gas assisted pressuring mechanism into imprinting.
The microstructures on the Si molds are first replicated onto thermoplastic PC film using gas-assisted hot embossing process. PDMS molds can be obtained by casting on the PC films. UV-curable resins are spreaded on the PDMS mold employing reversal imprinting technique. The PDMS mold and SiO2 substrate are then brought in contact and pressed using gas pressure in a closed chamber.
In this process, the PDMS soft mold is used and gas is used as pressuring media. Conformal contact and uniform imprinting pressure throughout the whole area can be achieved. Furthermore, PDMS mold has low surface energy and anti-adhere to resist. It is found that fabricating optical waveguide devices using this process can reduce residual layer to minimum. The ridge-shaped waveguides of 80μm width and 80μm depth were successfully made; the propagation losses measured at 1310 nm was 1.6 dB/cm. It is demonstrated that this technique has great potential for effectively replicating large area micro-nano structures.
Subjects
紫外光奈米壓印
氣體加壓機制
PDMS軟模具
光波導
完整接觸
反轉式壓印
奈米壓痕
Ultraviolet Nanoimprinting
Gas-Assisted pressuring mechanism
PDMS soft mould
Optical Waveguide
Conformal contact
Reversal Imprinting
Nanoindentation
Type
thesis
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