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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Low alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applications
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Low alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applications
Resource
Microelectronic Engineering 67-68: 312-318
Journal
Microelectronic Engineering 67-68:
Pages
312-318
Date Issued
2003
Date
2003
Author(s)
Chen, H. L.
Chuang, Y. F.
Lee, C. C.
Hsieh, C. I.
Ko, F. H.
Wang, L. A.
URI
http://ntur.lib.ntu.edu.tw//handle/246246/148201
Type
journal article
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Name
48.pdf
Size
398.91 KB
Format
Adobe PDF
Checksum
(MD5):4db96a61789afb1243e968b531b04440
