Low alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applications

Resource

Microelectronic Engineering 67-68: 312-318

Journal

Microelectronic Engineering 67-68:

Pages

312-318

Date Issued

2003

Date

2003

Author(s)

Chen, H. L.

Chuang, Y. F.

Lee, C. C.

Hsieh, C. I.

Ko, F. H.

Wang, L. A.

URI

Type

journal article

File(s)

Name

48.pdf

Size

398.91 KB

Format

Adobe PDF

Checksum

(MD5):4db96a61789afb1243e968b531b04440