SiGe nanorings by ultrahigh vacuum chemical vapor deposition
Journal
Applied Physics Letters
Journal Volume
94
Journal Issue
14
Date Issued
2009
Author(s)
Abstract
Formation of SiGe nanorings from Si capped Si0.1Ge0.9 quantum dots (QDs) grown at 500 °C by ultrahigh vacuum chemical vapor deposition was investigated. SiGe nanorings have average diameter, width, and depth of 185, 30, and 9 nm, respectively. Based on both Raman and x-ray diffraction results, the formation of SiGe nanorings can be attributed to Ge outdiffusion from central SiGe QDs during in situ annealing. Moreover, the depth of SiGe nanorings can be controlled by Si cap thickness. The Si cap is essential for nanorings formation.
Type
journal article