Electrical and optical reliability improvement of HfO2 gate dielectric by deuterium and hydrogen incorporation

Resource

Physical and Failure Analysis of Integrated Circuits, 2004. IPFA 2004. Proceedings of the 11th International Symposium on the

Journal

Physical and Failure Analysis of Integrated Circuits, 2004. IPFA 2004. Proceedings of the 11th International Symposium on the

Pages

-

Date Issued

2004-07

Date

2004-07

Author(s)

Yu, C.-Y.

Chen, T.C.

Lee, M.H.

Huang, S.-H.

Lee, L.S.

Liu, C.W.

DOI

N/A

URI

Type

journal article

File(s)

Name

01345578.pdf

Size

219.43 KB

Format

Adobe PDF

Checksum

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