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  4. Synthesis of Highly Symmetrical Acrylate Resins and their Applications for Nano Hybrids with Low Dielectric Constant Materials
 
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Synthesis of Highly Symmetrical Acrylate Resins and their Applications for Nano Hybrids with Low Dielectric Constant Materials

Date Issued
2009
Date
2009
Author(s)
Tseng, Hung-Yang
URI
http://ntur.lib.ntu.edu.tw//handle/246246/183179
Abstract
In this study, three difunctional acrylate monomers and two allyl monomers with high symmetry and low polarity were proposed and prepared. The obtained monomers were then purified and mixed with a difuntional acrylate monomer tricyclodecane dimethanol diacrylate(TDDA) to synthesize their homopolymers and copolymers by UV curing. The obtained materials have low dielectric constant about 2.36 because of the microphase separation of polymers. We can add the free space of the materials by microphase separation. After that, polyhedral oligomeric silsesquioxane (POSS) materials with acrylic functional groups were added into the polymers to form nano-hybrid materials. The dielectric constant of obtained nano-hybrid materials were found to be able to adjust from 2.36 to 2.0 for the cube structure of POSS. Besides, two kinds of monofuctional momomers were also used to prepare the copolymers. Because of the lower crosslinking density, the copolymers would have flexible property. The copolymers or hybrid materials not only have low dielectric constants but also have good thermal stability. The material T50IAc10SQ1 possessed low dielectric constant of 2.02 at 1MHz and high 5wt% degretation temperature (487ºC).
Subjects
UV curing
acrylate
POSS
low dielectric constants
Type
thesis
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ntu-98-R96549027-1.pdf

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