Repository logo
  • English
  • 中文
Log In
Have you forgotten your password?
  1. Home
  2. College of Electrical Engineering and Computer Science / 電機資訊學院
  3. Electronics Engineering / 電子工程學研究所
  4. Characterization of Inversion Tunneling Current for MOS Devices with High-k Gate Dielectrics
 
  • Details

Characterization of Inversion Tunneling Current for MOS Devices with High-k Gate Dielectrics

Date Issued
2008
Date
2008
Author(s)
Chen, Chih-Hao
URI
http://ntur.lib.ntu.edu.tw//handle/246246/189058
Abstract
The inversion tunneling current of MOS devices is composed of the generation current due to interface states, the generation-recombination current due to bulk traps, and the diffusion current from back contact. The generation-recombination current due to bulk traps is proportional to the depletion width. The deep-depletion behavior is observed from C-V curves and the deep-depletion width is extracted. According to the calculated results with increments of gate voltage, depletion width and inversion tunneling current, which are designed to eliminate the effects of generation current due to interface states and diffusion current, it was found the inversion tunneling current is dominated by the generation-recombination current due to bulk traps, and two different minority carrier generation lifetimes are acquired. One is the equivalent minority carrier generation lifetime due to surface trap which is close to the interface of Si-SiO2, and the other is the minority carrier generation lifetime due to bulk trap which is far from the interface of Si-SiO2. The quality of high-k gate dielectric is related to the occurred gate voltage of deep-depletion. The accumulation tunneling current would be smaller with higher occurred gate voltage of deep-depletion.l2O3 and HfO2 gate dielectrics show better capabilities to block the inversion tunneling current than SiO2 gate dielectrics at a small gate voltage and thus have the smaller inversion tunneling current. The saturation current of SiO2 gate dielectrics increases with increasing EOT due to sub-oxide effect. Al2O3 gate dielectrics show good capabilities to block the tunneling current in the saturation region, but HfO2 gate dielectrics show bad capabilities due to the small conduction band offset of HfO2, and the saturation current keeps the same value with increasing EOT. Al2O3 gate dielectrics have the best capabilities to block the inversion tunneling current and thus have the largest saturation voltage.
Subjects
inversion tunneling current
deep-depletion
Type
thesis
File(s)
Loading...
Thumbnail Image
Name

ntu-97-R95943058-1.pdf

Size

23.32 KB

Format

Adobe PDF

Checksum

(MD5):e827d20604f2d150eeb76374c80116fd

臺大位居世界頂尖大學之列,為永久珍藏及向國際展現本校豐碩的研究成果及學術能量,圖書館整合機構典藏(NTUR)與學術庫(AH)不同功能平台,成為臺大學術典藏NTU scholars。期能整合研究能量、促進交流合作、保存學術產出、推廣研究成果。

To permanently archive and promote researcher profiles and scholarly works, Library integrates the services of “NTU Repository” with “Academic Hub” to form NTU Scholars.

總館學科館員 (Main Library)
醫學圖書館學科館員 (Medical Library)
社會科學院辜振甫紀念圖書館學科館員 (Social Sciences Library)

開放取用是從使用者角度提升資訊取用性的社會運動,應用在學術研究上是透過將研究著作公開供使用者自由取閱,以促進學術傳播及因應期刊訂購費用逐年攀升。同時可加速研究發展、提升研究影響力,NTU Scholars即為本校的開放取用典藏(OA Archive)平台。(點選深入了解OA)

  • 請確認所上傳的全文是原創的內容,若該文件包含部分內容的版權非匯入者所有,或由第三方贊助與合作完成,請確認該版權所有者及第三方同意提供此授權。
    Please represent that the submission is your original work, and that you have the right to grant the rights to upload.
  • 若欲上傳已出版的全文電子檔,可使用Open policy finder網站查詢,以確認出版單位之版權政策。
    Please use Open policy finder to find a summary of permissions that are normally given as part of each publisher's copyright transfer agreement.
  • 網站簡介 (Quickstart Guide)
  • 使用手冊 (Instruction Manual)
  • 線上預約服務 (Booking Service)
  • 方案一:臺灣大學計算機中心帳號登入
    (With C&INC Email Account)
  • 方案二:ORCID帳號登入 (With ORCID)
  • 方案一:定期更新ORCID者,以ID匯入 (Search for identifier (ORCID))
  • 方案二:自行建檔 (Default mode Submission)
  • 方案三:學科館員協助匯入 (Email worklist to subject librarians)

Built with DSpace-CRIS software - Extension maintained and optimized by 4Science