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  4. Uniformity of Radiant on TFT-LCD Glass Substrate Under Rapid Thermal Processing
 
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Uniformity of Radiant on TFT-LCD Glass Substrate Under Rapid Thermal Processing

Date Issued
2005
Date
2005
Author(s)
Lai, Wen-Hong
DOI
zh-TW
URI
http://ntur.lib.ntu.edu.tw//handle/246246/62420
Abstract
Thin Film Transistor Liquid Crystal Display is recently one of Taiwan's most important industries. LCD Monitors are built on a glass substrate creating the basic elements and parts of the product. Then Color Light filters are fabricated. Therefore, glass substrate is the most important structure material. During the process of manufacturing LCD Monitors, using Rapid Thermal Processing (RTP) to speed up the heating process. Also it has several options of different heating degrees, thus avoiding material damage. Regardless of thermal convection inside RTP furnace and thermal conduction of glass substrate, this paper present a method that use rays trace to simulate the heat transfer phenomenon inside RTP furnace. We discuss the distributing of radiation from lamp which are received by glass substrate. We firstly put forward some methods for improving the uniformity of thermal radiation on the surface of glass substrate by changing the number of lamp, adjusting the shape, size and location of reflection board. Then we analyze the distance between lamp and the changes of distance from lamp to glass substrate in order to get better temperature distributing on the surface of glass substrate. We also concentrate our mind on the compensation of reflection thin board, from which we will probably obtain the optimal approach of designing RTP furnace.
Subjects
熱處理爐
玻璃基板
光線追蹤
快速熱制程
平面顯示器
RTP
TFT-LCD
glass
ray trace
radiation
Type
thesis
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ntu-94-R92543059-1.pdf

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Checksum

(MD5):b31759d784da0559a46906886acd97ab

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