Single-run single-mask inductively-coupled-plasma reactive-ion-etching process for fabricating suspended high-aspect-ratio microstructures

Resource

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS,45(1A),305-310.

Journal

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS

Journal Volume

45

Journal Issue

1a

Pages

305-310

Date Issued

2005

Date

2005

Author(s)

Yang, Y. J.

Kuo, W. C.

Fan, K. C.

URI

Type

journal article