Characteristics of plasma enhanced chemical vapor deposition-grown SiNx films prepared for deep ultraviolet attenuated phase-shifting masks

Resource

The Journal of Vacuum Science and Technology B 16? (6)?: 3612-3617

Journal

The Journal of

Journal Volume

Vacuum

Journal Issue

6

Pages

3612-3617

Date Issued

1998

Date

1998

Author(s)

Chen, H. L.

Wang, L.A.

Hsu, C.W.

URI

http://ntur.lib.ntu.edu.tw//handle/246246/95603

Type

journal article

File(s)

Name

03.pdf

Size

672.02 KB

Format

Adobe PDF

Checksum

(MD5):5e7337db24259ec620350d2b9cd9600b