提昇晶圓允收測試資料異常速移偵測之研究
Other Title
The Enhanced Abnormal Shift Detection of Wafer Acceptance Test Data
Date Issued
2001
Date
2001
Author(s)
DOI
892213E002125
Abstract
Under the effects of multiple-stream and
sequence-disorder, process change caused by one
machine at an in-line step may result in changes
in both the mean and variance of end-of-line
wafer acceptance test (WAT) data sequence. To
speed up trend detection of WAT data without
resorting to an intensive computing power, an
end-of-line SHEWMAC scheme is proposed,
which combines a Shewhart, an exponentially
weighted moving average (EWMA), and an
exponentially weighted moving Cpk (EWMC)
charts for jointly monitoring the mean and
variance of wafer lot average sequence from WAT
data. In view of the wide ranges of process
conditions and low volume of each product in a
foundry fab, a data normalization technique is
adopted to aggregate data of similar products and
a new design method is developed to generate a
robust set of scheme parameters. Simulation
and field data validation show that SHEWMAC is
superior to the combined Shewhart-EWMA
scheme in shift detection speed and is
complementary to the in-line SPC.
Subjects
Wafer Acceptance Test
Statistical
Process Control
Process Control
Exponentially Weighted Moving
Average
Average
Publisher
臺北市：國立臺灣大學工商管理學系
Type
report
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