Age-Based Double EWMA Controller and Its Application to CMP Processes
Resource
ieee transactions on semiconductor manufacturing 14(1), 11-19
Journal
IEEE transactions on semiconductor manufacturing
Journal Volume
14
Journal Issue
1
Pages
11-19
Date Issued
2001-02
Date
2001-02
Author(s)
DOI
20060927121650492918
Abstract
In the originally proposed run-by-run control scheme, the EWMA statistic is used as an estimate of the process deviation from its target. However, the controller based on the EWMA statistic is not sufficient for controlling a wearing out process. The PCC controller has been thus proposed to enhance the run-by-run controller capability. In this paper, we first reexamine the fundamentals of the PCC formulations and propose an adjustment that is advantageous in controlling processes subject to both random shifts and drifts. The adjusted PCC controller is then further refined to take into account the process age. This age-based double EWMA scheme is then applied to the CMP process, which is known in the semiconductor industry to be rather unstable
Subjects
CMP process, EWMA, run-by-run control.
SDGs
Type
journal article
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