Alkaline-developable and negative-type photosensitive polyimide with high sensitivity and excellent mechanical properties using photo-base generator
Journal
JOURNAL OF POLYMER SCIENCE
Journal Volume
58
Journal Issue
17
Pages
2366-2375
Date Issued
2020
Author(s)
Tseng, Ling-Ya
Lin, Yan-Cheng
Kuo, Chih-Cheng
Chen, Chun-Kai
Wang, Chuan-En
Kuo, Chi-Ching
Ueda, Mitsuru
Type
journal article