Low-temperature crystallization of electroceramic thin films at elevated pressure
Journal
Journal of Materials Chemistry
Journal Volume
12
Journal Issue
6
Pages
1628-1630
Date Issued
2002
Author(s)
Abstract
The crystallization of electroceramic thin films derived from amorphous precursor films has been significantly enhanced by using a high vapor-pressure annealing process as low as 350¢XC. This method not only considerably reduces the thermal budget and energy consumption during film processing, but also alleviates the interdiffusion between films and substrates.
SDGs
Other Subjects
article; crystallization; diffusion; energy; film; low temperature; precursor; pressure; vapor pressure
Type
journal article