Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning

Journal

Proceeding of SPIE, Optical Microlithography XXXII

Pages

1月3日

Date Issued

2019

Author(s)

Jia-Syun Cai

Sheng-Wei Chien

Chien-Lin Lee

Kuen-Yu Tsai*

James P. Shiely

Matt St. John

DOI

URI

Type

conference paper