Fabrication and Surface Treatment of Quartz Template for Photo-Curing Nanoimprint Lithography
Date Issued
2006
Date
2006
Author(s)
Li, Kuan-Lin
DOI
zh-TW
Abstract
Nanoimprint lithography technology (NIL) has emerged as one of the most promising technologies for high-throughput nanoscale patterning. It consists in replicating the patterns of template fabricated by electron beam lithography and reactive ion etching, by deforming physically a cross-linked polymer coated on substrate.
In this research, quartz is selected as the template material because of its transparency and high hardness. First, a 100nm thick Cr as a conducting layer is deposited on quartz template by thermal evaporation. Then, a 380nm thick positive photo-resist ZEP-520A is spin coated on Cr layer.
After E-beam lithography, the quartz template is fabricated by high density plasma reactive ion etch. Afterwards, the surface of the quartz template is treated by Tridecafluoro-1,1,2,2,tetrahydrooctyl trichlorosilane to form a self-assembling release layer.
Finally, photo-curing NIL is accomplished by pressing the surface-treated template to Si-substrate coated with cross-linked polymer mr-L 6000.3Xpe.
This research has successfully defined 60~100nm width resist features. Features of 80~120nm are resolved on the mode and transferred to the polymer after imprinting.
Subjects
光固化型奈米壓印微影
石英母模
脫模層
電子束微影
反應性離子蝕刻
Photo-curing nanoimprint lithography technology
Quartz template
Release layer
Electron-beam lithography
Reactive Ion Etch
Type
thesis
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