Skip to main content
English
中文
Log In
Log in
Log in with ORCID
NTU Single Sign On
Have you forgotten your password?
Home
College of Engineering / 工學院
Mechanical Engineering / 機械工程學系
Improving the sidewall quality of nanosecond laser-drilled deep through-silicon vias by incorporating a wet chemical etching process
Details
Improving the sidewall quality of nanosecond laser-drilled deep through-silicon vias by incorporating a wet chemical etching process
Journal
Micro & Nano Letters
Date Issued
2012
Author(s)
Chao-Wei Tang
Kuan-Ming Li
Hong-Tsu Young
HONG-TSU YOUNG
URI
http://jjap.jsap.jp/link?JJAP/51/06FL03/
https://scholars.lib.ntu.edu.tw/handle/123456789/587662
Type
journal article