Beam Drift Detection using a Two-Dimensional Electron Beam Position Monitor System for Multiple-Electron-Beam–Direct-Write Lithography

Journal

The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication

Pages

2-10

Date Issued

2010-06

Author(s)

S. Y. Chen

K. Y. Tsai

H. T. Ng

C. H. Fan

T. H. Pei

C. H. Kuan

Y. Y. Chen

Y. H. Kuo

C. J. Wu

J. Y. Yen

URI

Type

conference paper