Image Modeling for a High Numerical Aperture Microlithography System
Date Issued
2007
Date
2007
Author(s)
Chu, Kuan-Ju
DOI
en-US
Abstract
In the field of microlithography the demand for highly integrated electronic circuits has motivated investigation into better lens resolution. Traditional models used in microlithography are based on scalar image formation under the Fresnel approximations. This approximation holds in the low system but it breaks down when the exit pupil diameter is of the same order as the distance from pupil to image (high ), i.e. .
We successfully find vector imaging model in a high numerical aperture microlithography system. We survey papers about image modeling, and clearly reorganize the useful formulates from these papers. And we design different kinds of photo masks to compare the aerial image of the scalar imaging model and of the vector imaging model. We can clearly find that the intensity of the scalar model is much different from the intensity of the vector model when (high NA). So we should adopt the vector model when we need to calculate the aerial image in a high microlithography projection system.
In this thesis, we introduce some basic knowledge of optical lithography in chapter 1 and foundations of scalar diffraction theory in chapter 2. Then, scalar imaging with coherent illumination and partially coherent illumination is introduced in chapter3. The formulation about vector imaging model in a high numerical aperture microlithography system is derived in chapter 4. Simulation result and some comparisons will be shown in chapter 5. Finally conclusion will be made in chapter 6.
Subjects
微影術
空間影像
影像模型
microlithography
high NA
aerial image
image modeling
Type
thesis
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