Application of UV-LEDs to Microlithography
Date Issued
2009
Date
2009
Author(s)
Sung, Jeng-Gang
Abstract
The purpose of this study is utilizing UV-LED to microlithography, and expects to take advantage of UV-LED to replace mercury lamp in exposure system because of LED had long life and quick response. In this research, we constructed the contact exposure system in clean room to provide for testing light performance. The system included observes equipment, adjustable micro-stage and light module. UV-LEDs installed on the heat sink totally had three kinds of module in this study, Type 1 composed of six 1 Watt LEDs, Type 2 and 3 had seven and twelve 3 Watt LEDs. In experiment method, we used spherical surface, parabolic reflectors, parallel lens and collimator to improve optical characteristics. After S1813 photolithography process, the patterns had been measure size and count the minimum size in every region. Besides the light modules also had been test on PCB process in factory. The result of single LED with the spherical surface can print 20 um lines on substrate, but single LED had lower intensity that caused the exposure time must spend 5 minutes to complete. The parabolic reflectors can reduce the multiple images but it can’t eliminate this phenomenon which made by multi-light source, however it can enhance UV intensity about six to ten times, also decrease view of angle from 140 degree to 30 degree. When using parallel lens it can eliminate multiple images, but the result had spot because of UV-LEDs modules are not a perfect point source. In using collimate situation, the patterns on some region showed the lines are not continuous. UV-LEDs applied on PCB process can print 75 um size, and exposure time would below 30 seconds, it shows other way and feasibility to manufacture.
Subjects
UV-LED
exposure system
microlithography
Type
thesis
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