Research on the Dental Implant Surface Properties and Performances Using Atomic Layer Deposition Technique
Date Issued
2015
Date
2015
Author(s)
Lin, Wei-Chun
Abstract
Dental implant has been very popular nowadays, and implant therapy has also been in the limelight. By osseointegrated with patient’s alveolar bone, dental implants provide dentists another prosthetic treatment choice which can bear more occlusal force during chewing. Previous research pointed out that implant surface treatment may play an important role on implant osseointegration. The most commonly used dental implant materials are commercially pure titanium and Ti6Al4V. In natural environment, these titanium alloy mantles a cover of titanium dioxide passive layer in short time. Nevertheless, the cover of titanium dioxide is amorphous type and its depth is about 5-6 nm. For producing a more intensive and thicker cover of titanium dioxide to provide better environment for osteoblastic cells, atomic layer deposition technique is used. In this research, we tested four different thickness（0 nm, 20 nm, 50 nm, 100 nm）and two different crystal forms（amorphous, anatase）of titanium dioxide. Thicker titanium dioxides passive layer as expected to be more biocompatible. This research has two main parts, material analyses and cell experiments. Atomic force microscope, scanning electron microscope were carried out in material analyses. Cell viability, alkaline phosphatase assay, osteocalcin assay and immunofluorescence assay were carried out in cell experiments.
Subjects
implant surface treatment
atomic layer deposition techinique
titanium dioxide
Type
thesis
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