A novel bottom antireflective coating working for both KrF and ArF excimer laser lithography

Resource

Microelectronic Engineering 53 (1-4): 141-144

Journal

Microelectronic Engineering

Journal Issue

53

Pages

141-144

Date Issued

2000

Date

2000

Author(s)

Wang, L.A.

Chen, H.L.

URI

Type

journal article

File(s)

Name

09.pdf

Size

199.18 KB

Format

Adobe PDF

Checksum

(MD5):8baf63f6b2f14b86a76f43d43257c72e