Abnormal redeposition of silicate from Si 3 N 4 etching onto SiO 2 surfaces in flash memory manufacturing

Journal

Journal of Materials Science

Journal Volume

55

Journal Issue

3

Pages

1126-1135

Date Issued

2020

Author(s)

Teng, K.-W.

Tu, S.-H.

Hu, S.-W.

Huang, Y.-X.

Sheng, Y.-J.

Tsao, H.-K.

DOI

10.1007/s10853-019-04119-x

URI

https://www.scopus.com/inward/record.url?eid=2-s2.0-85074200789&partnerID=40&md5=84be623963afbe38b8d2f7c176c0547a

https://scholars.lib.ntu.edu.tw/handle/123456789/546562

SDGs

[SDGs]SDG9

Type

journal article