Thin-film deposition modeling of hydrogenated amorphous silicon in the afterglow of argon plasma

Journal

Computers and Fluids

Journal Volume

88

Pages

872-883

Date Issued

2013

Author(s)

Chau, S.W.

Pham, Q.T.

Nguyen, M.N.

DOI

10.1016/j.compfluid.2013.09.021

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/451604

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84888199875&doi=10.1016%2fj.compfluid.2013.09.021&partnerID=40&md5=37efd0ea886d975ed466982df8723698

Type

journal article