Studies on the chemical-mechanical polishing characterization of low dielectric constant polymers
Date Issued
2001
Date
2001
Author(s)
DOI
892214E002047
Subjects
化學機械研磨
低介電常數高分子
研磨粉體
界面活性劑
Publisher
臺北市:國立臺灣大學化學工程學系暨研究所
Type
report
File(s)![Thumbnail Image]()
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Name
892214E002047.pdf
Size
370.96 KB
Format
Adobe PDF
Checksum
(MD5):420c788a8e257730dc6802b03810895f
