Skip to main content
English
中文
Log In
Log in
Log in with ORCID
NTU Single Sign On
Have you forgotten your password?
Home
College of Electrical Engineering and Computer Science / 電機資訊學院
Photonics and Optoelectronics / 光電工程學研究所
Influence of rapid-thermal-annealing temperature on properties of rf-sputtered SnOx thin films
Details
Influence of rapid-thermal-annealing temperature on properties of rf-sputtered SnOx thin films
Journal
Applied Surface Science
Journal Volume
327
Pages
17654-17669
Date Issued
2015
Author(s)
Y.-H. Jiang
I-C. Chiu
P.-K. Kao
J.-C. He
Y.-H. Wu
Y.-J. Yang
C.-C. Hsu
I-C. Cheng
JIAN-ZHANG CHEN
DOI
10.1016/j.apsusc.2014.11.115
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/429483
Type
journal article