Nanometer Scale Focused Ion Beam Vacuum Lithography Using an Ultrathin Native Oxide Resist
Resource
Proceedings of SPIE--the International Society for Optical Engineering, v.1465, p.57-63
Journal
Proceedings of SPIE--the International Society for Optical Engineering
Journal Volume
v.1465
Pages
57-63
Date Issued
1991
Date
1991
Author(s)
Wang, Yuh-Lin
Type
conference paper