Publication:
Atmospheric pressure plasma jet annealed ZnO films for MgZnO/ZnO heterojunctions

cris.lastimport.scopus2025-05-30T22:32:52Z
cris.virtual.departmentChemical Engineeringen_US
cris.virtual.departmentPhotonics and Optoelectronicsen_US
cris.virtual.departmentElectrical Engineeringen_US
cris.virtual.departmentApplied Mechanicsen_US
cris.virtual.orcid0000-0002-8366-3592en_US
cris.virtual.orcid0000-0003-2209-3298en_US
cris.virtual.orcid0000-0002-1071-2234en_US
cris.virtualsource.department64920e95-e18e-486f-955e-8bb1487a22b4
cris.virtualsource.departmentdc25ca65-16bc-4802-a249-b56d52213993
cris.virtualsource.departmentdc25ca65-16bc-4802-a249-b56d52213993
cris.virtualsource.department637eb957-f29e-4601-bb87-0a218a01bcd3
cris.virtualsource.orcid64920e95-e18e-486f-955e-8bb1487a22b4
cris.virtualsource.orciddc25ca65-16bc-4802-a249-b56d52213993
cris.virtualsource.orcid637eb957-f29e-4601-bb87-0a218a01bcd3
dc.contributor.authorLien, S.-T.en_US
dc.contributor.authorLi, H.-C.en_US
dc.contributor.authorYang, Y.-J.en_US
dc.contributor.authorHsu, C.-C.en_US
dc.contributor.authorCheng, I.-C.en_US
dc.contributor.authorJIAN-ZHANG CHENen_US
dc.contributor.authorI-CHUN CHENGen_US
dc.contributor.authorHsu C.-C.en_US
dc.creatorLien, S.-T.;Li, H.-C.;Yang, Y.-J.;Hsu, C.-C.;Cheng, I.-C.;Chen, J.-Z.
dc.date.accessioned2020-06-16T06:32:14Z
dc.date.available2020-06-16T06:32:14Z
dc.date.issued2013
dc.identifier.doi10.1088/0022-3727/46/7/075202
dc.identifier.scopus2-s2.0-84873649454
dc.identifier.urihttps://scholars.lib.ntu.edu.tw/handle/123456789/502055
dc.identifier.urlhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-84873649454&doi=10.1088%2f0022-3727%2f46%2f7%2f075202&partnerID=40&md5=3af5dd90aac14c3b71ab7d8128bd2b47
dc.relation.ispartofJournal of Physics D: Applied Physics
dc.relation.journalissue8
dc.relation.journalvolume46
dc.titleAtmospheric pressure plasma jet annealed ZnO films for MgZnO/ZnO heterojunctionsen_US
dc.typejournal articleen
dspace.entity.typePublication

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