Titanium-based thin film metallic glass as diffusion barrier layer for PbTe-based thermoelectric modules
Journal
APL Materials
Journal Volume
7
Journal Issue
1
Start Page
13001
ISSN
2166532X
Date Issued
2019
Author(s)
Yu, Chia-Chi
Agne, Matthias T.
Witting, Ian T.
Deng, Ping-Yuan
Snyder, G. Jeffrey
Chu, Jinn P.
Abstract
The thin film metallic glass (TFMG) is an effective diffusion barrier layer for PbTe-based thermoelectric (TE) modules. Reaction couples structured with Cu/TFMG/PbTe are prepared via sputter-deposition and are annealed at 673 K for 8-96 h. The transmission line method is adopted for the assessment of electrical contact resistivity upon the PbTe/TFMG, and the value remains in the range of 3.3-2.5 × 10 −9 (Ω m 2 ). The titanium-based TFMG remains amorphous upon annealing at 673 K for 48 h and effectively blocks the inter-diffusion by not having grain-boundaries, which only allows the bulk diffusion between the metal electrode and the TE substrate. © 2019 Author(s).
Publisher
American Institute of Physics Inc.
Description
論文編號: 13001
Type
journal article