以光罩更換次數為主要評估標準, 為黃光區步進式對準機發展一啟發性投料與派工法則
Other Title
Developing a Heuristic Dispatch Rule for Steppers in Photolithography
Area to Minimize the Number of Photomask Changes
Area to Minimize the Number of Photomask Changes
Date Issued
1999
Date
1999
Author(s)
DOI
882416H002056
Abstract
This study proposed an input control policy,
called “SEQ-SEQ,” for a wafer fabrication based on
the special production characteristics of the steppers in
the photolithography area. For special production
characteristics of steppers, it means that the production
environment possesses reentrant production flows
where the same machine should processes the same job
when the job returns to this working area. To add the
complexity, the setup time of each production
operation is time-consuming. The “SEQ-SEQ” input
control policy releases k jobs sequentially for a
machine when the workload of this machine is lower
than a predefined threshold, and the machine wouldn’t
be allowed to change production operations until the
same operation of k jobs are finished. The purpose of
SEQ-SEQ is to reduce the time of setup operations,
and to raise the utilization of the machine. An
algorithm is proposed to determine the two parameters
to minimize the sum of the job waiting time and the
machine idle time.
In order to evaluate the suitability of the policy
in practice and to compare the performance with other
input control policies, the method of system simulation
is adopted in this study. The simulation model is built
according to the observation of a DRAM wafer
fabrication in Taiwan and the data needed in the
simulation model is collected from this plant. Finally,
as observing from the simulation results , SEQ-SEQ
would decrease the time of changing operations and
increase the throughput without increasing the cycle
time
Subjects
Photolighography area
Input control
policy
policy
Stepper
SEQ-SEQ policy
Simulation
Wafer
Fabrication
Fabrication
Workload
Publisher
臺北市：國立臺灣大學資訊管理學系暨研究所
Type
other
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