Analyses of edge effects on residual stresses in film strip/substrate systems
Journal
Journal of Applied Physics
Journal Volume
88
Journal Issue
5
Pages
3022-3028
Date Issued
2000
Author(s)
Abstract
The residual stress distribution in a thin-film strip overlaid on a substrate is influenced by the edges of the strip. An analytical model is developed to derive a closed-form solution for the stress distribution along the film width. Because the film is much thinner than the substrate, the stress variation through the film thickness is ignored; however, the stress variation through the substrate thickness is considered in the analysis. Compared to the existing analytical models, the present model is more rigorous and the analytical results agree better with both finite element results and experimental measurements. ? 2000, American Institute of Physics. All rights reserved.
Subjects
DISTRIBUTION FUNCTIONS
FINITE ELEMENT METHOD
GERMANIUM SILICIDES
RESIDUAL STRESSES
SILICON
SUBSTRATES
THIN FILMS
Type
journal article