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  5. Thermal diffusivity in diamond, SiC xN y and BC xN y
 
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Thermal diffusivity in diamond, SiC xN y and BC xN y

Journal
Diamond and Related Materials
Journal Volume
11
Journal Issue
 3-6
Pages
708-713
Date Issued
2002
Author(s)
Chattopadhyay S.
Chien S.C.
Chen L.C.
Chen K.H.
Lee H.Y.
LI-CHYONG CHEN  
DOI
10.1016/S0925-9635(01)00606-9
URI
https://www.scopus.com/inward/record.uri?eid=2-s2.0-0036508105&doi=10.1016%2fS0925-9635%2801%2900606-9&partnerID=40&md5=77fc2c12f7f674986feeee954c689613
https://scholars.lib.ntu.edu.tw/handle/123456789/616412
Abstract
Thermal diffusivity (α) of free standing diamond, amorphous silicon carbon nitride (a-SiC xN y) and boron carbon nitride (a-BC xN y) thin films on crystalline silicon, has been studied using the travelling wave technique. Thermal diffusivity in all of them was found to depend on the microstructure. For a-SiC xN y and a-BC xN y thin films two distinct regimes of high and low carbon contents were observed in which the microstructure changed considerably and that has a profound effect on the thermal diffusivity. The defective C(sp)-N phase plays a key role in determining the film properties. © 2002 Elsevier Science B.V. All rights reserved.
Subjects
Microstructure;Photoelectron spectroscopy;Physical vapour deposition;Thermal conductivity
Other Subjects
Thermal diffusivity;Microstructure;Silicon;Thin films;Diamonds;cutting tool;diamond coating;microstructure;thermal conductivity;vapor deposition
Type
journal article

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