Thermal diffusivity in diamond, SiC xN y and BC xN y
Journal
Diamond and Related Materials
Journal Volume
11
Journal Issue
3-6
Pages
708-713
Date Issued
2002
Author(s)
Abstract
Thermal diffusivity (α) of free standing diamond, amorphous silicon carbon nitride (a-SiC xN y) and boron carbon nitride (a-BC xN y) thin films on crystalline silicon, has been studied using the travelling wave technique. Thermal diffusivity in all of them was found to depend on the microstructure. For a-SiC xN y and a-BC xN y thin films two distinct regimes of high and low carbon contents were observed in which the microstructure changed considerably and that has a profound effect on the thermal diffusivity. The defective C(sp)-N phase plays a key role in determining the film properties. © 2002 Elsevier Science B.V. All rights reserved.
Subjects
Microstructure;Photoelectron spectroscopy;Physical vapour deposition;Thermal conductivity
Other Subjects
Thermal diffusivity;Microstructure;Silicon;Thin films;Diamonds;cutting tool;diamond coating;microstructure;thermal conductivity;vapor deposition
Type
journal article
