Influence of in situ applied stress during thermal oxidation of (111)Si on P-b interface defects

Journal

Applied Physics Letters

Journal Volume

82

Journal Issue

18

Pages

3038-3040

Date Issued

2003

Author(s)

Stesmans, A.

Pierreux, D.

Jaccodine, R. J.

Delph, T. J.

DOI

10.1063/1.1555277

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/443540

Type

journal article