Studies of chemically amplified deep UV resists for electron beam lithography applications

Journal

Proceedings of SPIE - The International Society for Optical Engineering

Journal Volume

4343

Pages

781-788

Date Issued

2001

Author(s)

Chen, H.L.

Hsu, C.K.

Chen, B.C.

Ko, F.H.

Yang, J.Y.

Huang, T.Y.

Chu, T.C.

DOI

10.1117/12.436705

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/491404

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-0034757243&doi=10.1117%2f12.436705&partnerID=40&md5=6594ff1d34ae42f803dc3d28418e7d55

Type

conference paper