Using Carbon-Fluorine polymer as wet etching mask to fabricate Si sawtooth grating and measuring with FTIR and Raman Spectrum
Date Issued
2010
Date
2010
Author(s)
Chen, Chien-Chung
Abstract
In this work, we fabricate Si sawtooth and triangle grating by wet etching .Then study the transmittance of infrared light and the intensity of Raman spectrum.
By electron beam lithography and anisotropic wet etching principle, we fabricate one-dimensional grating structure on the Si substrate, then observed by SEM. By Changing length of mask and etching time, we successfully fabricate sawtooth grating. During the experiment we also found that the residue after RIE process can be used as wet etching mask which was a kind of Carbon-Fluorine polymer, and then analyze it by XPS .
Then measuring the samples by FTIR and Raman spectrum. Comparing the infrared transmittances with different depths and angles of silicon grating.. We use light momentum conservation and dispersion relation to find out some wavelength position of extraordinary transmission phenomenon. there are some extraordinary transmission wavelength which can’t be explained by the theory. By Raman spectrum, we found that the sharp grating has stronger signal of Raman spectrum.
Subjects
electron beam lithography systems
anisotropic wet etching
RIE residues
extraordinary transmission
TETM mode
Raman spectrum
Type
thesis
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