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College of Electrical Engineering and Computer Science / 電機資訊學院
Photonics and Optoelectronics / 光電工程學研究所
Optimization of ECR-PECVD Grown HMDSO Films for The Bottom Antireflective Coating Layer in ArF Lithography
Details
Optimization of ECR-PECVD Grown HMDSO Films for The Bottom Antireflective Coating Layer in ArF Lithography
Journal
43th EIPBN
Pages
49-50
Date Issued
1999-01
Author(s)
L. A. Wang
H. L. Chen
LON A. WANG
URI
http://scholars.lib.ntu.edu.tw/handle/123456789/352328
Type
conference paper