Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects

Journal

Journal of Micro/Nanolithography, MEMS, and MOEMS

Journal Volume

10

Journal Issue

3

Pages

033010

Date Issued

2011-09

Author(s)

Philip C. W. Ng

Kuen-Yu Tsai

Lawrence S. Melvin III

DOI

URI

Type

journal article