Electron-beam proximity effect model calibration for fabricating scatterometry calibration samples
Journal
Advanced Lithography - Proceeding of SPIE
Pages
83242K
Date Issued
2012-02
Author(s)
Yu-Tian Shen
Liu, C.-H.
Chen, C.-Y.
Ng, H.-T.
Tsai, K.-Y.
Wang, F.-M.
Kuan, C.-H.
Lee, Y.-M.
Cheng, H.-H.
Li, J.-H.
CHIEH-HSIUNG KUAN
Type
conference paper