Recrystallized parylene as a mask for silicon chemical etching

Journal

3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems

Pages

881-884

Date Issued

2008

Author(s)

Lo, H.-W.

Kuo, W.-C.

Yang, Y.-J.

Tai, Y.-C.

DOI

10.1109/NEMS.2008.4484464

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/448541

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-50249154909&doi=10.1109%2fNEMS.2008.4484464&partnerID=40&md5=c5c9c6654adae2c72f9c9a7c7063489c

Type

conference paper