IPR Regime and Catch up:The Case of Taiwan’s IC Industry
Date Issued
2009
Date
2009
Author(s)
Lin, Hsin-Hsu
Abstract
This thesis concerns with the institutional influences of IPR regime on technological catching up, and attempts to examine the catch-up process of IC foundry, DRAM and IC design sectors of Taiwan’s semiconductor industry so as to highlight the contribution of IPR regime over time to technological development in each specific sector. The debate on the role of IPR regime is often cast as a choice between its positive and negative social consequences. Rather than taking an “either-or” view in the debate, the thesis proposes that there is no unique and simplistic solution to this argument. Three industry cases in Taiwan are used to show that, when an industry is far from the technological frontier, weak IPR protection can foster technological development by inducing the path-following catching up. But as an industry approaches or already stands at the technological frontier, the changes of IPR regime toward strictness and international harmonization become necessary.
Subjects
Technological Catch up
IPR Regime
Semiconductor Industry
Type
thesis
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