Phase masks fabricated by interferometric lithography for working in 248 nm wavelength

Resource

Microelectronic Engineering 67-68: 63-69

Journal

Microelectronic Engineering 67-68:

Pages

63-69

Date Issued

2003

Date

2003

Author(s)

Cheng, W. C.

Wang, L. A.

Hsieh, C. Y.

URI

Type

journal article

File(s)

Name

45.pdf

Size

691.4 KB

Format

Adobe PDF

Checksum

(MD5):dddb27979c2277291c42f53e03885480