The Study of Atmospheric Plasma Characteristics and Film Quality on GZO Thin Film Fabricated by APPJ Process
Date Issued
2014
Date
2014
Author(s)
Chang, Shih-Cheng
Abstract
In this study, we use APPJ generated by a DC pulse source to deposite GZO thin film in the atmosphere presurre environment without vacuum chamber. It will be discussed the effects of several key process parameters, including the power supply voltage, DC pulse, gas flow rate, nozzle temperature, the length of the nozzle, spray gap, to understand their relationship with the film quality and atmospheric plasma state.
By adjusting DC Pulse, the pulse frequency is found that have a greater impact on the plasma state and the film quality. When the pulse frequency is near 25kHz , lower sheet resistance can be gotten. Besides, we found when we adjust T-off time, the plasma and thin film quality will be influenced more than T-on time. By changing the power supply voltage, the secondary-side voltage decreases with increase of the instantaneous current and the plasma will become more intense. On the plasma nozzle temperature, the plasma nozzle with higher temperature have lower film sheet resistance. The flow rate’s effect have the lowest sheet resistance due to collocation of main gas rate and carry gas rate. By adjusting gap, the lower sheet resistance will show with lower gap; On nozzle length, long nozzle can get film with lower sheet resistance due to the effect of atmospheric quench.
By adjusting DC Pulse, the pulse frequency is found that have a greater impact on the plasma state and the film quality. When the pulse frequency is near 25kHz , lower sheet resistance can be gotten. Besides, we found when we adjust T-off time, the plasma and thin film quality will be influenced more than T-on time. By changing the power supply voltage, the secondary-side voltage decreases with increase of the instantaneous current and the plasma will become more intense. On the plasma nozzle temperature, the plasma nozzle with higher temperature have lower film sheet resistance. The flow rate’s effect have the lowest sheet resistance due to collocation of main gas rate and carry gas rate. By adjusting gap, the lower sheet resistance will show with lower gap; On nozzle length, long nozzle can get film with lower sheet resistance due to the effect of atmospheric quench.
Subjects
頻率
電源電壓
下部噴嘴長度
噴嘴溫度
噴射式大氣電漿
Type
thesis
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