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College of Engineering / 工學院
Mechanical Engineering / 機械工程學系
Interfacial reactions of rf-sputtered TiNi thin films on (100) silicon with a SiN diffusion barrier
Details
Interfacial reactions of rf-sputtered TiNi thin films on (100) silicon with a SiN diffusion barrier
Journal
Philosophical Magazine
Journal Volume
84
Journal Issue
12
Pages
1209-1218
Date Issued
2004
Author(s)
Wu, S.K.
Su, J.J.
Wang, J.Y.
SHYI-KAAN WU
DOI
10.1080/14786430310001646745
URI
http://www.scopus.com/inward/record.url?eid=2-s2.0-16544384874&partnerID=MN8TOARS
http://scholars.lib.ntu.edu.tw/handle/123456789/307435
Type
journal article