Rapid thermal postoxidation anneal engineering in thin gate oxides with al gates

Journal

IEEE Transactions on Electron Devices

Journal Volume

45

Journal Issue

1

Pages

247-253

Date Issued

1998

Author(s)

Chen, C.-Y.

Jeng, M.-J.

Hwu, J.-G.

DOI

10.1109/16.658838

URI

http://www.scopus.com/inward/record.url?eid=2-s2.0-0031647284&partnerID=MN8TOARS

http://scholars.lib.ntu.edu.tw/handle/123456789/338631

Type

journal article