Simulation of boron effects on OISF-ring dynamics for Czochralski silicon growth: a comparative study

Resource

Journal of Crystal Growth 266 (1-3): 132-139

Journal

Journal of Crystal Growth

Journal Issue

266

Pages

132-139

Date Issued

2004

Date

2004

Author(s)

Huang, L. I.

Lee, P. C.

Hsieh, C. K.

Shu, W. C.

DOI

URI

Type

journal article

File(s)

Name

41.pdf

Size

370.66 KB

Format

Adobe PDF

Checksum

(MD5):b37814cd1ad3e4e4bc54ecaf0dc3c3f6