High-resolution core-level photoemission study of CF 4 -treated Gd 2 O 3 (Ga 2 O 3 ) gate dielectric on Ge probed by synchrotron radiation
Journal
Applied Physics Letters
Journal Volume
98
Journal Issue
6
Date Issued
2011
Author(s)
Abstract
High-resolution core-level photoemission analysis using synchrotron radiation was used to investigate the superior electrical performance of aGa2O3(Gd2O3) gate dielectric on Ge(001) after CF4 treatment. Prior to the treatment, a thin germanate-like oxide layer that formed at the interface prevented Ge from diffusing to the surface. The Ge surface retained a small amount of buckled dimers from the as-grown sample. The buckled dimers were quickly removed by CF4 plasma treatment followed by an annealing process, resulting in a more uniform interface than that of the as-grown sample. The detailed interfacial electronic structure for the untreated and treated samples are presented.
SDGs
Type
journal article