DSpace 集合:https://scholars.lib.ntu.edu.tw/handle/123456789/591472024-03-28T15:25:00Z2024-03-28T15:25:00ZEnhancing electronic properties by suppressing nucleation delay for low-temperature processed atomic-layer-deposited amorphous zinc–tin-oxide thin filmsHung, Hsin NingCheng, Ching YunI-CHUN CHENGShyue, Jing JongWang, Ching ChiunFENG-YU TSAIhttps://scholars.lib.ntu.edu.tw/handle/123456789/6407692024-03-11T08:06:50Z2024-01-01T00:00:00Z標題: Enhancing electronic properties by suppressing nucleation delay for low-temperature processed atomic-layer-deposited amorphous zinc–tin-oxide thin films
作者: Hung, Hsin Ning; Cheng, Ching Yun; I-CHUN CHENG; Shyue, Jing Jong; Wang, Ching Chiun; FENG-YU TSAI
摘要: Atomic-layer-deposited (ALD) zinc-tin-oxide (ZTO) thin films offer promising electronic properties for many applications, but their development has been limited by their tendency to experience significant nucleation delay—which tends to introduce impurity—during deposition. This study utilized in-situ quartz crystal microbalance (QCM) analysis combined with ex-situ compositional analysis to examine the nucleation-delay characteristics of ZTO ALD and their dependence upon the oxidant-precursor settings. The results indicated that nucleation delay occurred solely during the ZnO-on-SnO2 deposition step as a result of persisting ethyl ligands of the organozinc precursor, diethylzinc, which could be mitigated by using H2O2 instead of H2O as the oxidant precursor and introducing a discrete-feeding or exposure procedure for the H2O2 half cycle to increase the effective oxidant dose. The effects of nucleation delay on the electronic properties of ALD ZTO films was examined with thin-film transistor (TFT) devices, where suppression of nucleation delay yielded substantial improvement in the device performance, achieving a high field-effect mobility of 21.5 cm2/V s, low sub-threshold swing of 0.16, high on/off ratio of 2 × 108, and enhance-mode operation without needing elevated-temperature post-processing. The findings present valuable improvements over the state of the art and provide insights useful for the development of other types of ALD multi-component films.2024-01-01T00:00:00ZNiFe2O4 Material on Carbon Paper as an Electrocatalyst for Alkaline Water Electrolysis ModuleWang, Ying ChyiYu, Shuo EnSu, Yu LunI-CHUN CHENGChuang, Yi ChengChen, Yong SongJIAN-ZHANG CHENhttps://scholars.lib.ntu.edu.tw/handle/123456789/6398802024-02-22T09:35:49Z2024-01-01T00:00:00Z標題: NiFe2O4 Material on Carbon Paper as an Electrocatalyst for Alkaline Water Electrolysis Module
作者: Wang, Ying Chyi; Yu, Shuo En; Su, Yu Lun; I-CHUN CHENG; Chuang, Yi Cheng; Chen, Yong Song; JIAN-ZHANG CHEN
摘要: NiFe2O4 material is grown on carbon paper (CP) with the hydrothermal method for use as electrocatalysts in an alkaline electrolyzer. NiFe2O4 material is used as the anode and cathode catalysts (named NiFe(+)/NiFe(−) hereafter). The results are compared with those obtained using CP/NiFe as the anode and CP/Ru as the cathode (named NiFe)(+)/Ru(−) hereafter). During cell operation with NiFe(+)/Ru(−), the current density reaches 500 mA/cm2 at a cell voltage of 1.79 V, with a specific energy consumption of 4.9 kWh/m3 and an energy efficiency of 66.2%. In comparison, for NiFe(+)/NiFe(−), the current density reaches 500 mA/cm2 at a cell voltage of 2.23 V, with a specific energy consumption of 5.7 kWh/m3 and an energy efficiency of 56.6%. The Faradaic efficiency is 96–99%. With the current density fixed at 400 mA/cm2, after performing a test for 150 h, the cell voltage with NiFe(+)/Ru(−) increases by 0.167 V, whereas that with NiFe(+)/NiFe(−) decreases by only 0.010 V. Good, long-term stability is demonstrated.2024-01-01T00:00:00ZLow-Pressure Plasma-Processed NiCo Metal–Organic Framework for Oxygen Evolution Reaction and Its Application in Alkaline Water Electrolysis ModuleSu, Yu LunYu, Shuo EnNi, I. ChihCHIH-I WUChen, Yong SongChuang, Yi ChengI-CHUN CHENGJIAN-ZHANG CHENhttps://scholars.lib.ntu.edu.tw/handle/123456789/6398792024-02-22T09:35:29Z2024-01-01T00:00:00Z標題: Low-Pressure Plasma-Processed NiCo Metal–Organic Framework for Oxygen Evolution Reaction and Its Application in Alkaline Water Electrolysis Module
作者: Su, Yu Lun; Yu, Shuo En; Ni, I. Chih; CHIH-I WU; Chen, Yong Song; Chuang, Yi Cheng; I-CHUN CHENG; JIAN-ZHANG CHEN
摘要: Ar, Ar/H2 (95:5), and Ar/O2 (95:5) plasmas are used for treating the NiCo metal–organic framework (MOF), and the plasma-processed NiCo MOF is applied for catalyzing the oxygen evolution reaction (OER) in a 1 M KOH electrolyte. Linear sweep voltammetry measurements show that after plasma treatment with Ar/H2 (95:5) and Ar gases, the overpotential reaches 552 and 540 mV, respectively, at a current density of 100 mA/cm2. The increase in the double-layer capacitance further confirms the enhanced oxygen production activity. We test the Ar plasma-treated NiCo MOF as an electrocatalyst at the OER electrode and Ru as an electrocatalyst at the hydrogen evolution reaction (HER) electrode in the alkaline water electrolysis module. The energy efficiency of the electrolyzer with the Ar plasma-processed NiCo-MOF catalyst increases from 54.7% to 62.5% at a current density of 500 mA/cm2 at 25 °C. The alkaline water electrolysis module with the Ar plasma-processed catalyst also exhibits a specific energy consumption of 5.20 kWh/m3 and 4.69 kWh/m3 at 25 °C and 70 °C, respectively. The alkaline water electrolysis module performance parameters such as the hydrogen production rate, specific energy consumption, and energy efficiency are characterized at temperatures between 25 °C and 70 °C. Our experimental results show that the NiCo MOF is an efficient OER electrocatalyst for the alkaline water electrolysis module.2024-01-01T00:00:00ZSimulation analysis of delivering light through turbid mediaSNOW H. TSENGKung, Te JenYu, Min Lunhttps://scholars.lib.ntu.edu.tw/handle/123456789/6349052023-09-01T08:06:21Z2016-01-01T00:00:00Z標題: Simulation analysis of delivering light through turbid media
作者: SNOW H. TSENG; Kung, Te Jen; Yu, Min Lun
摘要: We analyze light propagation through turbid media via numerical simulation. We simulate the propagation of light through a turbid medium and homing in the virtual light source to form an optical focus within the turbid medium.2016-01-01T00:00:00Z