DC 欄位 | 值 | 語言 |
dc.contributor.author | 陳靜枝 | zh_TW |
dc.creator | 陳靜枝 | - |
dc.date | 1999 | zh_TW |
dc.date.accessioned | 2006-07-26T01:37:05Z | - |
dc.date.accessioned | 2018-06-29T12:46:47Z | - |
dc.date.available | 2006-07-26T01:37:05Z | - |
dc.date.available | 2018-06-29T12:46:47Z | - |
dc.date.issued | 1999 | - |
dc.identifier | 882416H002056 | zh_TW |
dc.identifier.uri | http://ntur.lib.ntu.edu.tw//handle/246246/18803 | - |
dc.description.abstract | 本研究探討晶圓製造生產流程的瓶頸工作
區—黃光區—中步進式對準機特殊的生產特
性,也就是加工元件具有回流、且必須爭奪同
一資源(回到同一機台或是只有一台機台)、
機台製程轉換的整備時間耗時等特性,提出了
一套啟發式的下線法則,稱為順序投料法
(SEQ-SEQ input control policy )。其作法是針
對某一機台連續投料K 個加工元件,且機台必
須處理完這K 個加工元件的同一製程後,才能
轉換製程。其目的是藉由減少製程轉換的次
數,以減少機台因製程轉換所造成的時間浪
費,進而提高機台的使用率而增加產能。
為決定連續投料的批數K 與控制何時投料
的參數,本研究提出了一組合演算法,以最小
化加工元件等候時間和機台閒置時間的加權總
和作為搜尋控制參數的準則,藉此找到一組投
料數K 與控制何時投料的工作負荷臨界值,使
得回流加工元件彼此衝撞的機會降低,且機台
的使用率又能維持一定水準之上。
為了評估順序投料法在實際晶圓廠的適用
性,和比較順序投料法與其他已知下線法則的
優劣,本研究是利用系統模擬的方法來驗證。
並且依據台灣某DRAM 製造廠之生產流程以及
真實的生產資料,建構一模擬模型作為測試環
境。最後,模擬結果顯示順序投料法在不增長
生產週期的情況下,對於減少製程轉換的次
數、提升機台的產能均有顯著的改善。所以說
順序投料法的確適用於具有回流限制的生產環
境,而利用組合演算法所搜尋的投料數與控制下線的臨界值也是有效的。 | zh_TW |
dc.description.abstract | This study proposed an input control policy,
called “SEQ-SEQ,” for a wafer fabrication based on
the special production characteristics of the steppers in
the photolithography area. For special production
characteristics of steppers, it means that the production
environment possesses reentrant production flows
where the same machine should processes the same job
when the job returns to this working area. To add the
complexity, the setup time of each production
operation is time-consuming. The “SEQ-SEQ” input
control policy releases k jobs sequentially for a
machine when the workload of this machine is lower
than a predefined threshold, and the machine wouldn’t
be allowed to change production operations until the
same operation of k jobs are finished. The purpose of
SEQ-SEQ is to reduce the time of setup operations,
and to raise the utilization of the machine. An
algorithm is proposed to determine the two parameters
to minimize the sum of the job waiting time and the
machine idle time.
In order to evaluate the suitability of the policy
in practice and to compare the performance with other
input control policies, the method of system simulation
is adopted in this study. The simulation model is built
according to the observation of a DRAM wafer
fabrication in Taiwan and the data needed in the
simulation model is collected from this plant. Finally,
as observing from the simulation results , SEQ-SEQ
would decrease the time of changing operations and
increase the throughput without increasing the cycle
time | en |
dc.format | application/pdf | zh_TW |
dc.format.extent | 432774 bytes | - |
dc.format.mimetype | application/pdf | - |
dc.language | zh-TW | zh_TW |
dc.language.iso | zh_TW | - |
dc.publisher | 臺北市:國立臺灣大學資訊管理學系暨研究所 | zh_TW |
dc.rights | 國立臺灣大學資訊管理學系暨研究所 | zh_TW |
dc.subject | 黃光區 | zh_TW |
dc.subject | 步進式對準機 | zh_TW |
dc.subject | 晶圓投料法 | zh_TW |
dc.subject | 順序投料法 | zh_TW |
dc.subject | 回流 | zh_TW |
dc.subject | 系統模擬 | zh_TW |
dc.subject | Photolighography area | en |
dc.subject | Input control
policy | en |
dc.subject | Stepper | en |
dc.subject | SEQ-SEQ policy | en |
dc.subject | Simulation | en |
dc.subject | Wafer
Fabrication | en |
dc.subject | Workload | en |
dc.title | 以光罩更換次數為主要評估標準, 為黃光區步進式對準機發展一啟發性投料與派工法則 | zh_TW |
dc.title.alternative | Developing a Heuristic Dispatch Rule for Steppers in Photolithography
Area to Minimize the Number of Photomask Changes | en |
dc.type | other | en |
dc.identifier.uri.fulltext | http://ntur.lib.ntu.edu.tw/bitstream/246246/18803/1/882416H002056.pdf | - |
dc.coverage | 計畫年度:88;起迄日期:1998-08-01/1999-07-31 | zh_TW |
item.languageiso639-1 | zh_TW | - |
item.cerifentitytype | Products | - |
item.fulltext | with fulltext | - |
item.openairecristype | http://purl.org/coar/resource_type/c_1843 | - |
item.openairetype | other | - |
item.grantfulltext | open | - |
crisitem.author.dept | Information Management | - |
crisitem.author.parentorg | College of Management | - |
顯示於: | 資訊管理學系
|