https://scholars.lib.ntu.edu.tw/handle/123456789/153835
Title: | Application of Irradiation-Then-Nitridation to the Improvement of Radiation Hardness in MOS Gate Dielectrics | Authors: | Lee, K. C. 胡振國 Hwu, Jenn-Gwo |
Issue Date: | 1994 | URI: | http://ntur.lib.ntu.edu.tw//handle/246246/153884 |
Appears in Collections: | 電機工程學系 |
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